Product Description
Company Profile
SHEN LAN is a foreign trade enterprise in the field of professional and industrial pumps. Established in 2008, our factory has become a famous enterprise in the Chinese market, and our products are exported to Europe, America, Asia and Africa. The high quality of our products has won us high reputation both at home and abroad. The company has core patents, research and development of all kinds of different functions of slurry pump, desulfurization pump, clean water pump, vacuum pump and other products, Our products are applicable in various fields such as labs, chemical, petroleum, papermaking, pharmacy and food industries, and water and electricity factories. According to customers′ different use scenarios to develop technical solutions. Meet any customer needs. The company focuses on product quality, in accordance with the highest standards in the industry to produce, so that customers on quality rest assured, satisfied with the service. As a trustworthy China Supplier, we sincerely hope to cooperate with more friends worldwide.
Product Description
The D-type pump is designed to transport clean water or liquids with physical and chemical properties similar to clean water that do not contain CHINAMFG particles and have a temperature below 80C. Suitable for mines
Factory city water supply and drainage. The DF pump is designed for transporting liquids with temperatures ranging from -20C to 105C, which do not contain CHINAMFG particles and are corrosive. The inlet pressure of the pump is less than 6Mpa. The DY pump is suitable for conveying solids free particles. Oil petroleum products with a temperature of -20C~105C and a viscosity of less than 120 cm. The MD multi-stage wear-resistant pump is suitable for conveying particles in coal mines with a content not exceeding 1.5%. Neutral mine water with a particle size less than 0.5mm and a temperature not exceeding 40C and similar other sewage.
According to different purposes, D series can be divided into:
D: Suitable for transporting clean water without CHINAMFG particles or liquids with physical and chemical properties similar to clean water. The temperature of the transported medium is 0~+80ºC, the pump suction is horizontal, and the discharge is vertically upward.
DM: It is suitable for conveying liquids with a small amount of CHINAMFG particles and similar physical and chemical properties to clean water. The temperature of the conveyed medium is 0~+80ºC, the pump suction is horizontal, and the discharge is vertically upward.
DG: It is suitable for conveying clear water without CHINAMFG particles or objects with physical and chemical properties similar to clear water. The temperature of the conveyed medium is -20ºC~150ºC, and the suction and discharge of the pump are vertically upward.
DY: It is suitable for conveying petroleum products without CHINAMFG particles or other liquids similar to water. The temperature of the conveyed medium is -20ºC~+400ºC, and the suction and discharge of the pump are vertically upward.
DF: Suitable for conveying corrosive liquids without CHINAMFG particles, the temperature of the conveyed medium is -20ºC~+150ºC, and the suction and discharge of the pump are vertically upward.
All the above types of pumps can be selected with mechanical seals or soft packing seals according to user requirements, and the material of the flow-through parts can be cast iron, bronze, stainless steel or ordinary carbon steel.
Performance Parameters:
| Flow: | 3.7-1350m3/h |
| Head: | 33-1800m |
| Power: | 3-1600kw |
| Material: | Cast Iron,SS304,SS316,etc |
Product Description
Biref introduction:
ZLF (ZLX,ZLJ)vertical submerged chemical pump adopts double bearing supporting to improve the reliability and stability of operation. A suction pump below 2 m length can be added to pump inlet according to the requirement of working liquid level. Various materials are available for different applications. ZLF (ZLX,ZLJ)vertical submerged chemical pump is suitable for conveying fluids without solids or fluids with a few suspending particles. It is widely used in industries of electric power,mining,cement,metallurgy,non-ferrous metals…
Parameters:
- Flow rate:Q=9~460 (m³/h)
- Total head:H=10~65 (m)
- Pump speed:n=1450rpm
- Fluid s.g.:γ ≤1.5
- Fluid temperature:T=0~80ºC
- Pump diameter:50~200mm
Features:
- A new type vertical submerged centrifugal chemical pump conforms to standard JB/T8096-1998.
- Double bearing supporting to improve the reliability and stability of operation.
- Optimized hydraulic model to better adapt different applications.
- Several standard immersed depths of pump.A suction pipe can be added onto pump inlet flange when the pump immersed depth is longer than 1.5 m.
- Adopting low linear speed design for heavy slurry to extend pump life.
- Different anti-abrasive materials for various applications.
Structure:
- Single casing structure,pump casing is connected to the supporting tube,supporting tube is connected to bearing housing,bearing housing is connected to baseplate.
- Cylinder type bearing housing plus rolling bearings.
- Sealing ring as the shaft sealing,without any cooling water.
- A stir impeller is adopted beyond the impeller of ZLJ model to agitate slurry or particles in the fluids.
- Direct coupled Transmission.
FAQ
Q1. Are you a manufacturer?
Yes, we have been in centrifugal pumps manufacturing and marketing industry over 20 years.
Q2. What markets do your pumps export to?
Europe, North & South America, South-East Asia, Africa, Oceanica, Middle East countries. Our overseas agent in Italy, Russia, America and Africa are gradually improving.
Q3. What information should I let you know if I want to get a quotation?
Please let us know the pump capacity, head, medium, operation situation, quantity, etc. As much as your provide, the precision and accurate model selection.
Q4. Is it available to print our own brand on the pump?
Totally acceptable as international rules.
Q5. How can I get the price of your pump?
You can connect with us through any of the following contact information. Our personalized service person will respond you within 24 hours.
contact-info.html
| After-sales Service: | Timely Communication |
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| Warranty: | 1year |
| Max.Head: | 80-110m |
| Samples: |
US$ 5000/Set
1 Set(Min.Order) | Order Sample |
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| Customization: |
Available
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Shipping Cost:
Estimated freight per unit. |
about shipping cost and estimated delivery time. |
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| Payment Method: |
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Initial Payment Full Payment |
| Currency: | US$ |
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| Return&refunds: | You can apply for a refund up to 30 days after receipt of the products. |
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What Is the Role of Vacuum Pumps in Semiconductor Manufacturing?
Vacuum pumps play a critical role in semiconductor manufacturing processes. Here’s a detailed explanation:
Semiconductor manufacturing involves the production of integrated circuits (ICs) and other semiconductor devices used in various electronic applications. Vacuum pumps are used extensively throughout the semiconductor manufacturing process to create and maintain the required vacuum conditions for specific manufacturing steps.
Here are some key roles of vacuum pumps in semiconductor manufacturing:
1. Deposition Processes: Vacuum pumps are used in deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). These processes involve depositing thin films of materials onto semiconductor wafers to create various layers and patterns. Vacuum pumps help create a low-pressure environment necessary for precise control of the deposition process, ensuring uniform and high-quality film formation.
2. Etching and Cleaning: Vacuum pumps are utilized in etching and cleaning processes, which involve the removal of specific layers or contaminants from semiconductor wafers. Dry etching techniques, such as plasma etching and reactive ion etching, require a vacuum environment to facilitate the ionization and removal of material. Vacuum pumps aid in creating the necessary low-pressure conditions for efficient etching and cleaning processes.
3. Ion Implantation: Ion implantation is a process used to introduce impurities into specific regions of a semiconductor wafer to modify its electrical properties. Vacuum pumps are used to evacuate the ion implantation chamber, creating the required vacuum environment for accurate and controlled ion beam acceleration and implantation.
4. Wafer Handling and Transfer: Vacuum pumps are employed in wafer handling and transfer systems. These systems utilize vacuum suction to securely hold and manipulate semiconductor wafers during various manufacturing steps, such as loading and unloading from process chambers, robotic transfer between tools, and wafer alignment.
5. Load Lock Systems: Load lock systems are used to transfer semiconductor wafers between atmospheric conditions and the vacuum environment of process chambers. Vacuum pumps are integral components of load lock systems, creating and maintaining the vacuum conditions necessary for wafer transfer while minimizing contamination risks.
6. Metrology and Inspection: Vacuum pumps are utilized in metrology and inspection tools used for characterizing semiconductor devices. These tools, such as scanning electron microscopes (SEMs) and focused ion beam (FIB) systems, often operate in a vacuum environment to enable high-resolution imaging and accurate analysis of semiconductor structures and defects.
7. Leak Detection: Vacuum pumps are employed in leak detection systems to identify and locate leaks in vacuum chambers, process lines, and other components. These systems rely on vacuum pumps to evacuate the system and then monitor for any pressure rise, indicating the presence of leaks.
8. Cleanroom Environment Control: Semiconductor manufacturing facilities maintain cleanroom environments to prevent contamination during the fabrication process. Vacuum pumps are used in the design and operation of the cleanroom ventilation and filtration systems, helping to maintain the required air cleanliness levels by removing particulates and maintaining controlled air pressure differentials.
Vacuum pumps used in semiconductor manufacturing processes are often specialized to meet the stringent requirements of the industry. They need to provide high vacuum levels, precise control, low contamination levels, and reliability for continuous operation.
Overall, vacuum pumps are indispensable in semiconductor manufacturing, enabling the creation of the necessary vacuum conditions for various processes, ensuring the production of high-quality semiconductor devices.
How Do Vacuum Pumps Affect the Performance of Vacuum Chambers?
When it comes to the performance of vacuum chambers, vacuum pumps play a critical role. Here’s a detailed explanation:
Vacuum chambers are enclosed spaces designed to create and maintain a low-pressure environment. They are used in various industries and scientific applications, such as manufacturing, research, and material processing. Vacuum pumps are used to evacuate air and other gases from the chamber, creating a vacuum or low-pressure condition. The performance of vacuum chambers is directly influenced by the characteristics and operation of the vacuum pumps used.
Here are some key ways in which vacuum pumps affect the performance of vacuum chambers:
1. Achieving and Maintaining Vacuum Levels: The primary function of vacuum pumps is to create and maintain the desired vacuum level within the chamber. Vacuum pumps remove air and other gases, reducing the pressure inside the chamber. The efficiency and capacity of the vacuum pump determine how quickly the desired vacuum level is achieved and how well it is maintained. High-performance vacuum pumps can rapidly evacuate the chamber and maintain the desired vacuum level even when there are gas leaks or continuous gas production within the chamber.
2. Pumping Speed: The pumping speed of a vacuum pump refers to the volume of gas it can remove from the chamber per unit of time. The pumping speed affects the rate at which the chamber can be evacuated and the time required to achieve the desired vacuum level. A higher pumping speed allows for faster evacuation and shorter cycle times, improving the overall efficiency of the vacuum chamber.
3. Ultimate Vacuum Level: The ultimate vacuum level is the lowest pressure that can be achieved in the chamber. It depends on the design and performance of the vacuum pump. Higher-quality vacuum pumps can achieve lower ultimate vacuum levels, which are important for applications requiring higher levels of vacuum or for processes that are sensitive to residual gases.
4. Leak Detection and Gas Removal: Vacuum pumps can also assist in leak detection and gas removal within the chamber. By continuously evacuating the chamber, any leaks or gas ingress can be identified and addressed promptly. This ensures that the chamber maintains the desired vacuum level and minimizes the presence of contaminants or unwanted gases.
5. Contamination Control: Some vacuum pumps, such as oil-sealed pumps, use lubricating fluids that can introduce contaminants into the chamber. These contaminants may be undesirable for certain applications, such as semiconductor manufacturing or research. Therefore, the choice of vacuum pump and its potential for introducing contaminants should be considered to maintain the required cleanliness and purity of the vacuum chamber.
6. Noise and Vibrations: Vacuum pumps can generate noise and vibrations during operation, which can impact the performance and usability of the vacuum chamber. Excessive noise or vibrations can interfere with delicate experiments, affect the accuracy of measurements, or cause mechanical stress on the chamber components. Selecting vacuum pumps with low noise and vibration levels is important for maintaining optimal chamber performance.
It’s important to note that the specific requirements and performance factors of a vacuum chamber can vary depending on the application. Different types of vacuum pumps, such as rotary vane pumps, dry pumps, or turbomolecular pumps, offer varying capabilities and features that cater to specific needs. The choice of vacuum pump should consider factors such as the desired vacuum level, pumping speed, ultimate vacuum, contamination control, noise and vibration levels, and compatibility with the chamber materials and gases used.
In summary, vacuum pumps have a significant impact on the performance of vacuum chambers. They enable the creation and maintenance of the desired vacuum level, affect the pumping speed and ultimate vacuum achieved, assist in leak detection and gas removal, and influence contamination control. Careful consideration of the vacuum pump selection ensures optimal chamber performance for various applications.
What Is a Vacuum Pump, and How Does It Work?
A vacuum pump is a mechanical device used to create and maintain a vacuum or low-pressure environment within a closed system. Here’s a detailed explanation:
A vacuum pump operates on the principle of removing gas molecules from a sealed chamber, reducing the pressure inside the chamber to create a vacuum. The pump accomplishes this through various mechanisms and techniques, depending on the specific type of vacuum pump. Here are the basic steps involved in the operation of a vacuum pump:
1. Sealed Chamber:
The vacuum pump is connected to a sealed chamber or system from which air or gas molecules need to be evacuated. The chamber can be a container, a pipeline, or any other enclosed space.
2. Inlet and Outlet:
The vacuum pump has an inlet and an outlet. The inlet is connected to the sealed chamber, while the outlet may be vented to the atmosphere or connected to a collection system to capture or release the evacuated gas.
3. Mechanical Action:
The vacuum pump creates a mechanical action that removes gas molecules from the chamber. Different types of vacuum pumps use various mechanisms for this purpose:
– Positive Displacement Pumps: These pumps physically trap gas molecules and remove them from the chamber. Examples include rotary vane pumps, piston pumps, and diaphragm pumps.
– Momentum Transfer Pumps: These pumps use high-speed jets or rotating blades to transfer momentum to gas molecules, pushing them out of the chamber. Examples include turbomolecular pumps and diffusion pumps.
– Entrapment Pumps: These pumps capture gas molecules by adsorbing or condensing them on surfaces or in materials within the pump. Cryogenic pumps and ion pumps are examples of entrainment pumps.
4. Gas Evacuation:
As the vacuum pump operates, it creates a pressure differential between the chamber and the pump. This pressure differential causes gas molecules to move from the chamber to the pump’s inlet.
5. Exhaust or Collection:
Once the gas molecules are removed from the chamber, they are either exhausted into the atmosphere or collected and processed further, depending on the specific application.
6. Pressure Control:
Vacuum pumps often incorporate pressure control mechanisms to maintain the desired level of vacuum within the chamber. These mechanisms can include valves, regulators, or feedback systems that adjust the pump’s operation to achieve the desired pressure range.
7. Monitoring and Safety:
Vacuum pump systems may include sensors, gauges, or indicators to monitor the pressure levels, temperature, or other parameters. Safety features such as pressure relief valves or interlocks may also be included to protect the system and operators from overpressure or other hazardous conditions.
It’s important to note that different types of vacuum pumps have varying levels of vacuum they can achieve and are suitable for different pressure ranges and applications. The choice of vacuum pump depends on factors such as the required vacuum level, gas composition, pumping speed, and the specific application’s requirements.
In summary, a vacuum pump is a device that removes gas molecules from a sealed chamber, creating a vacuum or low-pressure environment. The pump accomplishes this through mechanical actions, such as positive displacement, momentum transfer, or entrapment. By creating a pressure differential, the pump evacuates gas from the chamber, and the gas is either exhausted or collected. Vacuum pumps play a crucial role in various industries, including manufacturing, research, and scientific applications.
editor by CX 2023-11-28